Infraestructures and Research Techniques

Physical parameters measurement advanced techniques


  • Magnetic characterization magnetometers:
    • SQUID. Hmáx=5T-Temperature range: 4K – 400K.
    • Vibrating sample magnetometer VSM. Hmáx=1.5T-Temperature range: 4K – 1000K.
    • Maglab equimpent. Hmáx=9T-Temperature range: 4K – 400K.

X-Ray techniques:

  • X-Ray Difractometer-Reflectometer:
    • Bruker D8 Advance model. The device has two detectors, a sparkling classic one and a high-speed matrix sensor that allows the measurement in a very fast way. It also has a Göbell mirror that can be used as reflectometer in structural studies of thin film samples.

Electric resistance measurement:

  • Criostatic instalation of Helium closed flow that allows the measurement of an electric resistance between 10K and 300K. MagLab system also can with the option of perform resistance and magnetoresistance measurements between 4K and 400K, with magnetic fields applied with an intensity of 9T maximum.

Nanoscale materials and samples production equipment

Deposition techniques equipment (sputtering):

  • Thin film sputtering:
    • Sputtering Leybold Z400. It allows to deposit 3 different materials.
    • Sputtering BocEdwards.
    • High-vacuum camera with 2 magnetrons and an own-designed cluster cannon.
    • This whole elements allow the manufacturing of materials in a thin film shape, multilayered structures and amorphous and nanograined alloys.

Computational Resources


  • 96-core AMD Opteron(tm) Processor 6172 mini-cluster.


  • GeForce GTX 680 – 1536 cuda cores – 2GB Memory

© Advanced Materials, Nuclear Technology and Applied Nanotechnology Department. University of Burgos.

Authors: Santiago Cuesta López, Oscar Tapia Júdez, Ekhi Arroyo Fernández de Leceta.

Funding by Ministerio de Economía y Competitividad.

Reference: MAT2011-15800-E.